Plasma Etch Industry Advantages

Plasma etching technology offers a wide range of cost-effective, safe, and environmentally sound solutions to problems faced by manufacturers in the electronic, industrial, and medical sectors.

Plasma Etch Advantages Overview

The utility and flexibility of plasma technology stems from the fact that plasma can be used to modify a variety of surfaces under precisely controlled conditions, without the safety hazards and liquid waste associated with wet cleaning and etching. If effective surface treatment is critical to the efficiency of a process or the reliability of a product, plasma technology may provide the answer.

Plasma etching technology is being used to remove organic and inorganic contamination, increase wettability, increase bond strength, and remove residue. The process is effective on a variety of materials used in an even greater variety of products.

Plasma Etch can help the Electronic Industry

For years, manufacturers in the electronics sector have used plasma etching systems for a variety of surface modification and etching applications. Developments and innovations in the field of plasma technology have dramatically expanded the capabilities and potential uses of this clean, safe, cost-effective process.

Plasma cleaningt systems are now being used for the cleaning or etching of hybrids, PCBs, SMTs, BGAs, lead frames, and flat panel displays. Plasma etching systems remove organic contaminants and prepare surfaces for adhesive bonding, wire bonding, soldering, and marking.

The use of plasma technology for surface preparation will increase the wettability and adhesion of a variety of materials.
Plasma cleaning of hybrids dramatically improves wirebond strengths and reduces the likelihood of circuit failure. Epoxy bleed out, residual photoresist, solvent residues and other organic contaminants are safely removed with a short exposure to plasma.

Printed circuit board manufacturers use plasma etching systems for drill smear removal of plated throughholes. And thanks to recent breakthroughs in reactive ion etching (RIE), manufacturers now have an exciting new alternative for the formation of micro vias.

Plasma can also clean polyimide inner layers prior to lamination to increase layer to layer bond strength.

Plasma Etch can help the Industrial Industry

The benefits of plasma cleaning sysytems are not limited to high technology industries. Many manufacturing processes depend upon effective surface modification to produce durable, reliable products.

The ability of plasma to modify almost any surface in a safe, environmentally friendly, and cost-effective process, makes it a viable solution to challenging problems in many different industries.

Plasma etching systems are utilized for surface activation, etching, and deposition with a variety of materials. The plasma process can render most materials:

• Clean
• Hydrophilic (Wettable)
• Hydrophobic (Non Wettable)
• Bondable
• Markable
• Lubricated
• Abrasion Resistant
• Passivated
• Many Other Uniquely Engineered Surface Characteristics


For many products, whether they're produced for consumers, industry, aerospace, or health care, durability and quality depend upon the bond between two surfaces. Whether the surfaces are metal, ceramic, polymeric, plastic, or a combination thereof, plasma has the potential to improve adhesion, and therefore, the quality of the final product.

Plasma Etch can help the Medical Industry

Nowhere is the need for quality and reliability greater than in medical devices. Adhesion, markability, lubricity, and wettability are important factors in the manufacture of various types of medical equipment such as:

• Syringes
• Ultra Thin Tubing
• Angioplasty Balloons
• Catheters
• Filters
• Sensors

Once again, proper surface treatment is necessary to ensure quality and reliability.
The qualities that make plasma a viable option for surface treatment in the electronic and industrial sectors - safety, environmental friendliness, cost effectiveness, and controllability - may also make plasma cleaners the right choice for many medical equipment manufacturers.

Plasma Etch can help the Solar panel

Vacuum plasma is primarily used in applications such as the deposition of amorphous hydrogenated silicon nitride (SiN) layers -enhanced chemical vapor deposition (PECVD) process to create anti-reflection and surface (and bulk) passivation on thin-film solar cells.

Plasma technology is being used in the solar panel to increase wettability, increase bond strength, and remove residue. This process is very effective as the technology is changing in the solar panel industry. The utility and flexibility of plasma technology stems from the fact that plasma can be used to modify a variety of surfaces under precisely controlled conditions, without the safety hazards and liquid wastes associated with wet cleaning and etching or damage to your product.

More About Plasma Etch

Plasma Etch Quick Fact

Nitrogen (N2) Purge
Our plasma systems using CF4 gas as a process gas feature nitrogen purging that is automatic and functional any time the vacuum pump is operational. Our purging function is transparent to the operator and has no impact on normal processing.

It creates a dry environment within equipment or a system by measuring the dryness of the purge gas as it leaves the system being dried, thus minimizing the amount of nitrogen needed per purge. NEPS nitrogen purge systems are suitable for use with containers and enclosures.

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plasma system 3522 Arrowhead Drive Carson City, NV 89706
Tel: 775-883-1336 Fax: 775-883-2559
Email: sales@plasmaetch.com