Plasma Etch Technological Advantages

High Capacity Vacuum System

GENERAL
System designs must support high gas flow rates at low operating pressures to meet the requirements of the desmear/etchback process.

DESCRIPTION
Plasma Etch Desmear/Etchback Systems utilize a two stage vacuum system consisting of a backing pump in combination with a blower.

ADVANTAGES
• High gas flow rates and low chamber pressure result in faster process times and optimum etchback characteristics.
• Process uniformity and processing throughput are enhanced.

More About Plasma Etch

Plasma Etch Quick Fact

When Plasma Etch, Inc. began designing plasma etching systems in the early 1980s, we recognized that, for many applications, plasma technology could be a cost effective solution to difficult processing problems. It was clear, however, that plasma technology posed several challenges.

To meet those challenges, Plasma Etch took an applications oriented approach to system design, and sought to provide new and innovative solutions to our customers.

Plasma Systems			Contact Us Today	Plasma Etch Inc.
PE-50 PE-50XL PE-100 PE-200	BT-1 TT-1 MK-II MK-III	PE-1000 PE-2000R Large Batch Tumbler Custom Machines		3522 Arrowhead Drive Carson City, NV 89706 Tel: 775-883-1336 Fax: 775-883-2559 Email: sales@plasmaetch.com