Cleanliness
Our plasma equipment does not require any cleaning nor do our plasma systems contaminate the substrate during processes. Our systems produce the etchback/desmear process as the only reaction taking place.
Plasma Etch has studied and designed the systems to provide excellent, clean service. Plasma Etch, Inc., has always offered plasma systems that require no or low maintenance with extremely high reliability. Our plasma systems require no additional secondary plasma sequences to remove deposited residues from the plasma process which dramatically damages production throughput.