Etch Rates
The etch rates of our systems are an amazing 2-3X faster than competing, comparable plasma systems. This data was concluded through tests done by our customers.
Plasma Etch, Inc. has built plasma equipment for over 27 years. We have been involved in many experimental collaborations utilizing Plasma Etch processes. We have unceasingly tried and tested many aspects of the plasma processes. Through the use of High R.F. Power and Patented Plasma Process Temperature Control and Patented Electrostatic Shielding, among other design factors, we guarantee excellent quality at the highest etch rates.
This can vary widely per plasma system manufacturer and is one the primary features of a plasma machine. Many factors effect etch rate results such as R.F. power, electrode design, uniformity, system design, temperature control, vacuum range, etc.
Plasma Etch, Inc. has always provided very fast etch rates, consistent processing with reliable, even predictable processing.