PE-100 Benchtop Plasma System

PE-100 Benchtop Plasma System

The PE-100 is a complete plasma treatment solution capable of reactive ion etching, plasma functionalization, and more. This model is perfect for manufacturers, medical facilities, universities, research facilities, or any other company in need of a cost-effective, production-grade plasma processing solution.

The convenient chamber size, along with the availability of high frequency RF power, combine to create a production capable unit small enough to fit nearly anywhere in your lab or production work space.

Full laptop control enables enhanced consistency and complexity of recipes. PC automation also provides ease of use on the production floor.

This model is available in one of three standard configurations:
1) Plasma Cleaning/Plasma Etching
2) Reactive Ion Etching (RIE)
3) Convertible Configuration - Includes both isotropic and anisotropic plasma processing in a single system. Removable tray configuration.


To purchase a PE-100, please contact us at (775) 883-1336 or email us at sales@plasmaetch.com.


Standard Features

Electrode Configuration

Three Stacked Horizontal (9"Wx13"D + 3" Clearance) (Several optional configurations available)

Generator

300W 100KHz Continuously Variable Power Supply

Control System

A laptop loaded with Plasma Etch, Inc. software is included for fully automatic system operation, process sequencing, multiple recipe storage, and other advanced features

Gas Control

One 0-50cc Mass Flow Controller

Vacuum Gauge

1-2000 mT

Vacuum Pump

8CFM 2-Stage Direct Drive Oil Pump with Oil Mist Coalescing Filter (Oxygen Service – Krytox Charged)

Chamber Material

6061-T6 Aluminum

Chamber Dimensions

12”x14.5”x12”

Unit Dimensions

17"x28"x30"

Unit Weight

160lbs

Vacuum Pump Weight

68lbs

Made in the U.S.A.

Optional Features

Most systems can be customized with a wide range of options including:

Custom Sized Vacuum Chamber, Number/Size of Electrodes

To ensure your system is able to specifically meet your throughput requirements

Reactive Ion Electrodes

Enables reactive ion etching

MHz Power Supplies with Automatic Matching Network

Higher watt/frequency power supplies

PC-based Control System

For fully automatic system control, multi-step process sequencing, multiple recipe storage, data logging/trending, events/alarms, etc.

Electrostatic Shielding

Greatly increases process uniformity by eliminating excess etching at the outer bounds of the processed material

Temperature Control System

To maintain specific temperatures in the processing chamber for enhanced uniformity and application-specific needs

Dry Vacuum Pump

For more control over the process chamber pressure

Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas Generator

To ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity

Vacuum Pump Oil Mist Eliminator

Captures oil from vacuum pump exhaust

Vacuum Pump Oil Filtration

Filters the vacuum pump oil down to a 3 micron level, increasing the longevity of the oil and the vacuum pump

Automatic Vacuum Control

Provides automation of the process chamber pressure

Additional Digital Mass Flow Controllers

Provides digital automation and monitoring of process gases

Software Configurable Gas Steering Matrix

Designed to allow for up to 5 process gas inputs with 3 selectable at any time

Low Gas-Source Alarm

Notification for when your process gas container needs replenished

Light Tower

For easy visualization of the steps of the plasma processing sequence

Fume Scrubber

To eliminate hazardous fumes/contaminants from the chamber/vacuum pump exhaust

Facility Requirements

Electrical

120VAC / 60Hz @ 15A or 220VAC / 50Hz @ 14A

Compressed Air Service

80-100PSI, 0.5CFM

Regulated Process Gases

15PSI, 2-Stage Regulator