PE-2000R Reel to Reel Plasma Etcher
The PE-2000R is specially fitted with a continuous feed drive and take up system to accommodate continuous flexible substrates and roll/reel mounted materials. Our Reel-to-Reel system can accept web widths of 2” to 24” with spindle diameters of 10”.
Built as an extension of our MK-II platform, it offers you the same repeatability, reliability and long life, as well as low maintenance costs. The RIE (Reactive Ion Etch) electrode offers the highest directional plasma effect.
The large all aluminum chambers accommodate a generously sized active processing surface located between the feed and take up spools.
Its industrial powder coated frame has a rugged and easy to clean design with an eye to guarding your processing environment from contamination.
Our standard vacuum pump is especially prepared for oxygen service. It is fully equipped with an N2 purge system, preventing any corrosive end products forming in the pump thus extending the service life and reducing the maintenance cycle. Processing your spooled product, whether they be small or large, PTFE, polyamide or Rigid-Flex Circuits, you will find that all are evenly etched and cleaned by the PE-2000R, ready for the next step in production.
Our simple to use, intuitive touch screen interface has control over every aspect of the plasma process ensuring reliability and repeatability.
Low cost to maintain equates to low cost of ownership. Rest assured that Plasma Etch will be there for you as long as you own your system.
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