We create a wide range of plasma processing systems designed to suit the needs of every industry. Our systems are actively employed in areas of plasma cleaning, plasma etching, and surface modification. With over 30 years of experience in building plasma systems and collaborating with other companies, we have developed the most effective, cost-efficient plasma treatment systems in the industry.
Every system can be thoroughly customized with a wide range of options to ensure that our clients receive a system which specifically meets the requirements of their application. For clients which have a project which exceeds our standard system specifications, we have the capability to design custom systems on a per-case basis which will take care of their project. All of our systems are manufactured with the strictest of quality control at our headquarters location in Carson City, NV.
The PE-25 is our lowest cost, entry level option for plasma treatment.
The PE-50 is a feature packed, low cost, entry level option for plasma treatment.
The PE-50XL has all the features of the PE-50, but includes a larger processing chamber/electrodes.
The PE-75 is our largest compact model with a larger size and feature set than the PE-50XL.
The PE-100 is a complete plasma treatment solution - capable of plasma cleaning, etching, reactive ion etching, and more.
The PE-200 is our largest benchtop model with considerable processing space and a wide variety of options.
The BT-1 is a large-scale, full featured plasma processing system suitable for all plasma treatment applications.
The BT-Tumbler is a plasma processing system with an end-loading rotating horizontal drum for uniform treatment of bulk loaded items.
The TT-1 is a surface modification system with a rotating electrode designed to meet the needs of the wire bonding industry.
The PE-2000R is a Reel-to-Reel plasma processing system fitted with a continuous feed drive to accommodate continuous flexible substrates and roll/reel mounted materials.
The MK-II is a heavy duty plasma processing system with a large processing chamber and up to 24 electrode shelves.
The MAGNA is the pinnacle of plasma technology - able to perform plasma etching with no CF4 gas and an unparalleled degree of uniformity. It is designed for the most demanding plasma etching applications.