sales@plasmaetch.comPlasma Cleaning Basics
February 22nd, 2011 • by Matt Hutchings
Plasma can be defined as an ionized gas of positively and negatively charged particles. The properties of plasma are similar to both gas and liquid. Commonly used gases include O2, N2, Ar, H2, and CF4. These five gasses used singularly or in combination are used in the majority of the labs around the world for activation, etching and modification of surface chemistry.
Plasma Cleaning Terminology
February 21nd, 2011 • by Matt Hutchings
Plasma: A gas with electrons removed from a significant fraction of the atoms. These atoms with missing electrons are Ions.
